Inductive plasma processor having coil with plural windings and method of controlling plasma density
A Standard patent application filed on 29 March 2002 credited to Chen, Jian J. ; Wicker, Thomas E. ; Veltrop, Robert G.

Details

Application number :

2002250466  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Inductive plasma processor having coil with plural windings and method of controlling plasma density  

Inventor :

Chen, Jian J. ; Wicker, Thomas E. ; Veltrop, Robert G.  

Agent name :

 

Address for service :

 

Filing date :

29 March 2002  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538-6516  

Old name :

 

Original Source :

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