Stacked rf excitation coil for inductive plasma processor
A Standard patent application filed on 29 March 2002 credited to Chen, Jian J.
;
Wicker, Thomas E.
;
Veltrop, Robert G.
Details
Application number :
2002250464
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Stacked rf excitation coil for inductive plasma processor
Inventor :
Chen, Jian J.
;
Wicker, Thomas E.
;
Veltrop, Robert G.