Chemical vapor deposition devices and methods
A Standard patent application filed on 27 December 2001 credited to Hunt, Andrew T.
;
Danielson, Doug
;
Witbrod, Frank
;
Fortunato, Fred
;
Tomov, Trifon
;
Luten, Henry A. Iii
;
Oljaca, Miodrag
;
Neumuller, Travis
;
Neuman, George A.
Details
Application number :
2002249829
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Chemical vapor deposition devices and methods
Inventor :
Hunt, Andrew T.
;
Danielson, Doug
;
Witbrod, Frank
;
Fortunato, Fred
;
Tomov, Trifon
;
Luten, Henry A. Iii
;
Oljaca, Miodrag
;
Neumuller, Travis
;
Neuman, George A.
Agent name :
Address for service :
Filing date :
27 December 2001
Associated companies :
Applicant name :
MICROCOATING TECHNOLOGIES, INC.
Applicant address :
5315 Peachtree Industrial Blvd., Atlanta, GA 30341