System and method for controlling deposition thickness
A Standard patent application filed on 13 March 2002 credited to Hylton, Todd Lanier ; Baldwin, David Alan

Details

Application number :
2002247329  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
System and method for controlling deposition thickness  
Inventor :
Hylton, Todd Lanier ; Baldwin, David Alan  
Agent name :
 
Address for service :
 
Filing date :
13 March 2002  
Associated companies :
 
Applicant name :
4WAVE, INC.  
Applicant address :
828 North Henry Street, Alexandria, VA 22314  
Old name :
 
Original Source :
Go  

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