Method and apparatus for monitoring a semiconductor wafer during a spin drying operation
A Standard patent application filed on 21 December 2001 credited to Treur, Randolph E.

Details

Application number :

2002232884  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for monitoring a semiconductor wafer during a spin drying operation  

Inventor :

Treur, Randolph E.  

Agent name :

 

Address for service :

 

Filing date :

21 December 2001  

Associated companies :

 

Applicant name :

LAM RESEARCH CORPORATION  

Applicant address :

4650 Cushing Parkway, Fremont, CA 94538  

Old name :

 

Original Source :

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