Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice
A Standard patent application filed on 21 December 2001 credited to Mizuno, Yasushi
Details
Application number :
2002216393
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice
Inventor :
Mizuno, Yasushi
Agent name :
Address for service :
Filing date :
21 December 2001
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331