Details

Application number :
2002216393  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice  
Inventor :
Mizuno, Yasushi  
Agent name :
 
Address for service :
 
Filing date :
21 December 2001  
Associated companies :
 
Applicant name :
NIKON CORPORATION  
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331  
Old name :
 
Original Source :
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Same Inventor