Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device
A Standard patent application filed on 27 December 1999 credited to Motegi, Kiyoshi ; Mizuno, Yasushi

Details

Application number :

18017  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method for cleaning optical device, exposure apparatus and exposure method, method for manufacturing device, and device  

Inventor :

Motegi, Kiyoshi ; Mizuno, Yasushi  

Agent name :

 

Address for service :

 

Filing date :

27 December 1999  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

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