Enhanced plasma mode, method, and system for plasma immersion ion implantation
A Standard patent application filed on 23 November 1999 credited to Liu, Wei ; Bryan, Michael A. ; Roth, Ian S.

Details

Application number :

17457  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Enhanced plasma mode, method, and system for plasma immersion ion implantation  

Inventor :

Liu, Wei ; Bryan, Michael A. ; Roth, Ian S.  

Agent name :

 

Address for service :

 

Filing date :

23 November 1999  

Associated companies :

 

Applicant name :

Silicon Genesis Corporation  

Applicant address :

 

Old name :

 

Original Source :

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