Optical monitoring and control system and method for plasma reactors
A Standard patent application filed on 30 March 2001 credited to Johnson, Wayne L. ; Liu, Lianjun

Details

Application number :

2001251216  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Optical monitoring and control system and method for plasma reactors  

Inventor :

Johnson, Wayne L. ; Liu, Lianjun  

Agent name :

 

Address for service :

 

Filing date :

30 March 2001  

Associated companies :

 

Applicant name :

Tokyo electron Limited  

Applicant address :

 

Old name :

 

Original Source :

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