Highly efficient compact capacitance coupled plasma reactor/generator and method
A Standard patent application filed on 23 March 2001 credited to Chiu, Kin-Chung Ray

Details

Application number :

2001249429  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Highly efficient compact capacitance coupled plasma reactor/generator and method  

Inventor :

Chiu, Kin-Chung Ray  

Agent name :

 

Address for service :

 

Filing date :

23 March 2001  

Associated companies :

 

Applicant name :

Electrochemical Technology Corporation  

Applicant address :

 

Old name :

 

Original Source :

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