Details

Application number :
2001240136  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and apparatus for repairing lithography masks using charged particle beam system  
Inventor :
Ferranti, David C. ; Szelag, Sharon M. ; Casey Jr., James David  
Agent name :
 
Address for service :
 
Filing date :
09 March 2001  
Associated companies :
 
Applicant name :
FEI Company  
Applicant address :
 
Old name :
 
Original Source :
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