Method and apparatus for repairing lithography masks using charged particle beam system
A Standard patent application filed on 09 March 2001 credited to Ferranti, David C. ; Szelag, Sharon M. ; Casey Jr., James David

Details

Application number :

2001240136  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for repairing lithography masks using charged particle beam system  

Inventor :

Ferranti, David C. ; Szelag, Sharon M. ; Casey Jr., James David  

Agent name :

 

Address for service :

 

Filing date :

09 March 2001  

Associated companies :

 

Applicant name :

FEI Company  

Applicant address :

 

Old name :

 

Original Source :

Go