Method and device for attenuating harmonics in semiconductor plasma processing systems
A Standard patent application filed on 09 February 2001 credited to Mitrovic, Andrej S. ; Johnson, Wayne L. ; Windhorn, Thomas H.

Details

Application number :
2001234960  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method and device for attenuating harmonics in semiconductor plasma processing systems  
Inventor :
Mitrovic, Andrej S. ; Johnson, Wayne L. ; Windhorn, Thomas H.  
Agent name :
 
Address for service :
 
Filing date :
09 February 2001  
Associated companies :
 
Applicant name :
Tokyo electron Limited  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor