Polycrystalline silicon and process and apparatus for producing the same
A Standard patent application filed on 09 May 2001 credited to Oda, Hiroyuki
;
Wakamatsu, Satoru
Details
Application number :
56670
Application type :
Standard
Application status :
SEALED
Under opposition :
No
Proceeding type :
Invention title :
Polycrystalline silicon and process and apparatus for producing the same
Inventor :
Oda, Hiroyuki
;
Wakamatsu, Satoru
Agent name :
PHILLIPS ORMONDE FITZPATRICK
Address for service :
367 Collins Street MELBOURNE VIC 3000
Filing date :
09 May 2001
Associated companies :
Applicant name :
Tokuyama Corporation
Applicant address :
1-1 Mikage-cho Tokuyama-shi Yamaguchi 745-0053 Japan