Pumping system for reducing the effects of wafer outgasing on beam purity in an ion implanter
A Standard patent application filed on 08 January 2001 credited to Berrian, Donald W ; Pollock, John D. ; Vanderpot, John W

Details

Application number :

27721  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Pumping system for reducing the effects of wafer outgasing on beam purity in an ion implanter  

Inventor :

Berrian, Donald W ; Pollock, John D. ; Vanderpot, John W  

Agent name :

 

Address for service :

 

Filing date :

08 January 2001  

Associated companies :

 

Applicant name :

Multilevel Metals, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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