Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
A Standard patent application filed on 06 October 1998 credited to Zhang, Liming ; Krusell, Wilbur C. ; Hymes, Diane J. ; Zhao, Yuexing

Details

Application number :

97884  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Methods and apparatus for cleaning semiconductor substrates after polishing of copper film  

Inventor :

Zhang, Liming ; Krusell, Wilbur C. ; Hymes, Diane J. ; Zhao, Yuexing  

Agent name :

 

Address for service :

 

Filing date :

06 October 1998  

Associated companies :

 

Applicant name :

OnTrak Systems, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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