Method of producing silicon thin-film photoelectric transducer and plasma cvd apparatus used for the method
A Standard patent application filed on 28 October 1998 credited to Okamoto, Yoshifumi ; Yamamoto, Kenji ; Yoshimi, Masashi

Details

Application number :

96494  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of producing silicon thin-film photoelectric transducer and plasma cvd apparatus used for the method  

Inventor :

Okamoto, Yoshifumi ; Yamamoto, Kenji ; Yoshimi, Masashi  

Agent name :

 

Address for service :

 

Filing date :

28 October 1998  

Associated companies :

 

Applicant name :

Kaneka Corporation  

Applicant address :

 

Old name :

 

Original Source :

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