Process chamber and method for depositing and/or removing material on a substrate
A Standard patent application filed on 03 August 1998 credited to Chiu, Ting H.
;
Holtkamp, William H.
;
Cho, Peter
;
Lowery, Kenneth J
;
Ko, Wen C.
Details
Application number :
86864
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Process chamber and method for depositing and/or removing material on a substrate
Inventor :
Chiu, Ting H.
;
Holtkamp, William H.
;
Cho, Peter
;
Lowery, Kenneth J
;
Ko, Wen C.