Projection aligner, projection exposure method, optical cleaning method and method of fabricating semiconductor device
A Standard patent application filed on 24 July 1998 credited to Ogata, Taro ; Nei, Masahiro

Details

Application number :

83581  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Projection aligner, projection exposure method, optical cleaning method and method of fabricating semiconductor device  

Inventor :

Ogata, Taro ; Nei, Masahiro  

Agent name :

 

Address for service :

 

Filing date :

24 July 1998  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

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