Thinner for rinsing photoresist and method of treating photoresist layer
A Standard patent application filed on 08 December 2000 credited to Park, Hong-Sick ; Ju, Jin-Ho ; Kang, Doek-Man ; Kang, Sung-Chul ; Oh, Sae-Tae ; Lee, Yu-Kyung

Details

Application number :
20271  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Thinner for rinsing photoresist and method of treating photoresist layer  
Inventor :
Park, Hong-Sick ; Ju, Jin-Ho ; Kang, Doek-Man ; Kang, Sung-Chul ; Oh, Sae-Tae ; Lee, Yu-Kyung  
Agent name :
 
Address for service :
 
Filing date :
08 December 2000  
Associated companies :
 
Applicant name :
Samsung Electronics Co., Ltd.  
Applicant address :
 
Old name :
 
Original Source :
Go