Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
A Standard patent application filed on 21 November 2000 credited to Galewski, Carl ; Sneh, Ofer

Details

Application number :

19254  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition  

Inventor :

Galewski, Carl ; Sneh, Ofer  

Agent name :

 

Address for service :

 

Filing date :

21 November 2000  

Associated companies :

 

Applicant name :

Genus, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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