Deposited film forming process, deposited film forming apparatus and process for manufacturing semiconductor element
A Standard patent application filed on 09 March 1998 credited to Yajima, Takahiro ; Fujioka, Yasushi ; Okabe, Shotaro ; Kohda, Yuzo ; Ohtoshi, Hirokazu ; Sakai, Akira ; Sawayama, Tadashi ; Kanai, Masahiro

Details

Application number :

58292  

Application type :

Standard  

Application status :

SEALED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Deposited film forming process, deposited film forming apparatus and process for manufacturing semiconductor element  

Inventor :

Yajima, Takahiro ; Fujioka, Yasushi ; Okabe, Shotaro ; Kohda, Yuzo ; Ohtoshi, Hirokazu ; Sakai, Akira ; Sawayama, Tadashi ; Kanai, Masahiro  

Agent name :

SPRUSON & FERGUSON  

Address for service :

GPO Box 3898 SYDNEY NSW 2001  

Filing date :

09 March 1998  

Associated companies :

 

Applicant name :

Canon Kabushiki Kaisha  

Applicant address :

30-2 Shimomaruko 3-chome Ohta-ku Tokyo Japan  

Old name :

 

Original Source :

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