Polishing pad and method for making polishing pad with elongated microcolumns
A Standard patent application filed on 30 September 1997 credited to Meikle, Scott G ; Doan, Trung Tri

Details

Application number :
46619  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Polishing pad and method for making polishing pad with elongated microcolumns  
Inventor :
Meikle, Scott G ; Doan, Trung Tri  
Agent name :
 
Address for service :
 
Filing date :
30 September 1997  
Associated companies :
 
Applicant name :
Micron Technology, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor