Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
A Standard patent application filed on 22 August 1997 credited to Dietliker, Kurt ; De Leo, Christoph ; Yamato, Hitoshi ; Kunz, Martin

Details

Application number :

44552  

Application type :

Standard  

Application status :

CEASED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity  

Inventor :

Dietliker, Kurt ; De Leo, Christoph ; Yamato, Hitoshi ; Kunz, Martin  

Agent name :

Davies Collison Cave  

Address for service :

GPO Box 3876 SYDNEY NSW 2001  

Filing date :

22 August 1997  

Associated companies :

 

Applicant name :

Ciba Specialty Chemicals Holding Inc.  

Applicant address :

Klybeckstrasse 141 CH-4057 Basel Switzerland  

Old name :

 

Original Source :

Go  

Same Inventor

• New oxime sulfonates and the use thereof as latent sulfonic acids