Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist
A Standard patent application filed on 10 June 1997 credited to Hobbs, Douglas S.

Details

Application number :

32223  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist  

Inventor :

Hobbs, Douglas S.  

Agent name :

 

Address for service :

 

Filing date :

10 June 1997  

Associated companies :

 

Applicant name :

Holographic Lithography Systems  

Applicant address :

 

Old name :

 

Original Source :

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