Temperature control system for plasma processing apparatus
A Standard patent application filed on 14 November 2000 credited to Bailey, Andrew D. III ; Kuthi, Andras ; Smith, Michael G. R. ; Schoepp, Alan M.

Details

Application number :

14903  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Temperature control system for plasma processing apparatus  

Inventor :

Bailey, Andrew D. III ; Kuthi, Andras ; Smith, Michael G. R. ; Schoepp, Alan M.  

Agent name :

 

Address for service :

 

Filing date :

14 November 2000  

Associated companies :

 

Applicant name :

Lam Research Corporation  

Applicant address :

 

Old name :

 

Original Source :

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