Chuck heater for improved planar deposition process
A Standard patent application filed on 02 November 2000 credited to Boek, Heather D. ; Boylan, Elizabeth A. ; Huang, Haibo ; Tandon, Pushkar ; Lewis, Gary L. ; Ryszytiwskyj, William P. ; Laborde, Pascale

Details

Application number :

14553  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Chuck heater for improved planar deposition process  

Inventor :

Boek, Heather D. ; Boylan, Elizabeth A. ; Huang, Haibo ; Tandon, Pushkar ; Lewis, Gary L. ; Ryszytiwskyj, William P. ; Laborde, Pascale  

Agent name :

 

Address for service :

 

Filing date :

02 November 2000  

Associated companies :

 

Applicant name :

Corning Incorporated  

Applicant address :

 

Old name :

 

Original Source :

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