Removal of photoresist and residue from substrate using supercritical carbon dioxide process
A Standard patent application filed on 01 November 2000 credited to Mullee, William H. ; Schilling, Paul E. ; Biberger, Maximilian A.

Details

Application number :

14550  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Removal of photoresist and residue from substrate using supercritical carbon dioxide process  

Inventor :

Mullee, William H. ; Schilling, Paul E. ; Biberger, Maximilian A.  

Agent name :

Davies Collison Cave  

Address for service :

Level 15 1 Nicholson Street MELBOURNE VIC 3000  

Filing date :

01 November 2000  

Associated companies :

 

Applicant name :

Tokyo Electron Limited  

Applicant address :

Aksaka 5-chome Minato-ku Tokyo 107-8481 Japan  

Old name :

 

Original Source :

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