Method and apparatus for transferring a reticle pattern to large area substrate by scanning
A Standard patent application filed on 06 February 1997 credited to Knirck, Jeffrey G. ; Swanson, Paul A. ; Gibson, John A.

Details

Application number :

18578  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for transferring a reticle pattern to large area substrate by scanning  

Inventor :

Knirck, Jeffrey G. ; Swanson, Paul A. ; Gibson, John A.  

Agent name :

 

Address for service :

 

Filing date :

06 February 1997  

Associated companies :

 

Applicant name :

Megapanel Corporation  

Applicant address :

 

Old name :

 

Original Source :

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