Method of forming dielectric films with reduced metal contamination
A Standard patent application filed on 11 December 1996 credited to Carvalheira, Helder Rodrigues

Details

Application number :

12881  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method of forming dielectric films with reduced metal contamination  

Inventor :

Carvalheira, Helder Rodrigues  

Agent name :

 

Address for service :

 

Filing date :

11 December 1996  

Associated companies :

 

Applicant name :

Watkins-Johnson Company  

Applicant address :

 

Old name :

 

Original Source :

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