Magnification control and thermal substrate chuck for photolithography
A Standard patent application filed on 11 October 1996 credited to Knirck, Jeffrey G. ; Tobin, James F ; Swanson, Paul A.

Details

Application number :

74382  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Magnification control and thermal substrate chuck for photolithography  

Inventor :

Knirck, Jeffrey G. ; Tobin, James F ; Swanson, Paul A.  

Agent name :

 

Address for service :

 

Filing date :

11 October 1996  

Associated companies :

 

Applicant name :

Magapanel Corporation  

Applicant address :

 

Old name :

 

Original Source :

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