Method of modifying an exposed surface of a semiconductor wafer
A Standard patent application filed on 19 September 1996 credited to Bruxvoort, Wesley J
;
Culler, Scott R
;
Ho, Kwok-Lun
;
Kaisaki, David A
;
Williams, Julia P.
;
Klun, Thomas P
;
Kranz, Heather K.
;
Messner, Robert P.
;
Webb, Richard J
;
Kessel, Carl R
Details
Application number :
72413
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method of modifying an exposed surface of a semiconductor wafer
Inventor :
Bruxvoort, Wesley J
;
Culler, Scott R
;
Ho, Kwok-Lun
;
Kaisaki, David A
;
Williams, Julia P.
;
Klun, Thomas P
;
Kranz, Heather K.
;
Messner, Robert P.
;
Webb, Richard J
;
Kessel, Carl R