Improved method and apparatus for chemical mechanical polish ing

Application number :: 57963
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Improved method and apparatus for chemical mechanical polish ing
Inventor :: Hoshizaki, Jon A. ; Williams, Roger O. ; Buhler, James D. ; Lee, Lawrence L. ; Hollywood, William K. ; De Geus, Richard ; Reichel, Charles A.
Agent name :
Address for service :
Filing date :: 17 May 1996
Associated companies :
Applicant name :: Exclusive Design Company, Inc.
Applicant address :
Old name :
Original Source :: Go

Improved method and apparatus for chemical mechanical polish ing A Standard patent application filed on 17 May 1996 credited to Hoshizaki, Jon A. ; Williams, Roger O. ; Buhler, James D. ; Lee, Lawrence L. ; Hollywood, William K. ; De Geus, Richard ; Reichel, Charles A.