Details

Application number :
11108  
Application type :
Standard  
Application status :
SEALED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus  
Inventor :
Yamakoshi, Hideo ; Satake, Koji ; Murata, Masayoshi ; Mashima, Hiroshi ; Aoi, Tatsufumi ; Takeuchi, Yoshiaki  
Agent name :
Davies Collison Cave  
Address for service :
Level 15 1 Nicholson Street MELBOURNE VIC 3000  
Filing date :
09 January 2001  
Associated companies :
 
Applicant name :
Mitsubishi Heavy Industries Limited  
Applicant address :
5-1 Marunouchi 2-chome Chiyoda-ku Tokyo Japan  
Old name :
 
Original Source :
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