Reference wafer for controlling accuracy and method for producing the same, aligner, and method for fabricating device
A Standard patent application filed on 16 October 2000 credited to Shiraishi, Naomasa
Details
Application number :
76873
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Reference wafer for controlling accuracy and method for producing the same, aligner, and method for fabricating device