Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls
A Standard patent application filed on 13 December 1993 credited to Low, Kah Kuen ; Vasudev, Prahalad K

Details

Application number :

57494  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging and method of fabricating phase shifters with absorbing/attenuating sidewalls  

Inventor :

Low, Kah Kuen ; Vasudev, Prahalad K  

Agent name :

 

Address for service :

 

Filing date :

13 December 1993  

Associated companies :

 

Applicant name :

Sematech, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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