Photosensitive resin compositions, photosensitive element containing the same, process for producing resist pattern, and process for producing printed circuit board
A Standard patent application filed on 18 September 2000 credited to Hidaka, Takahiro ; Muramatsu, Yukiko ; Murakami, Yasuharu ; Natori, Michiko

Details

Application number :

73150  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photosensitive resin compositions, photosensitive element containing the same, process for producing resist pattern, and process for producing printed circuit board  

Inventor :

Hidaka, Takahiro ; Muramatsu, Yukiko ; Murakami, Yasuharu ; Natori, Michiko  

Agent name :

 

Address for service :

 

Filing date :

18 September 2000  

Associated companies :

 

Applicant name :

Hitachi Chemical Co. Ltd.  

Applicant address :

 

Old name :

 

Original Source :

Go