Chemical vapor deposition from single organometallic precursors
A Standard patent application filed on 18 June 1993 credited to Barron, Andrew R ; Power, Michael B ; Jenkins, Phillip P ; Hepp, Aloysius F ; Macinnes, Andrew N

Details

Application number :

46386  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Chemical vapor deposition from single organometallic precursors  

Inventor :

Barron, Andrew R ; Power, Michael B ; Jenkins, Phillip P ; Hepp, Aloysius F ; Macinnes, Andrew N  

Agent name :

 

Address for service :

 

Filing date :

18 June 1993  

Associated companies :

 

Applicant name :

President and Fellows of Harvard College  

Applicant address :

 

Old name :

 

Original Source :

Go