Semiconductor wafer processing cvd reactor cleaning method and apparatus
A Standard patent application filed on 11 June 1993 credited to Foster, Robert F ; Rebenne, Helen E ; Arora, Rikhit ; White, Carl L ; Leblanc, Rene E

Details

Application number :
46330  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Semiconductor wafer processing cvd reactor cleaning method and apparatus  
Inventor :
Foster, Robert F ; Rebenne, Helen E ; Arora, Rikhit ; White, Carl L ; Leblanc, Rene E  
Agent name :
 
Address for service :
 
Filing date :
11 June 1993  
Associated companies :
 
Applicant name :
Materials Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor