Method for forming a patterned semiconductor film
A Standard patent application filed on 31 August 2000 credited to Amundson, Karl
;
Drzaic, Paul S.
;
Kazlas, Peter
;
Duthaler, Gregg
;
Wang, Jianna
Details
Application number :
71033
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Method for forming a patterned semiconductor film
Inventor :
Amundson, Karl
;
Drzaic, Paul S.
;
Kazlas, Peter
;
Duthaler, Gregg
;
Wang, Jianna