Polymer for chemically amplified resist and a resist composition using the same
A Standard patent application filed on 25 August 2000 credited to Kim, Deog-Bae ; Chung, Yoon-Sik ; Choi, Yong-Joon ; Kim, Hyun-Jin

Details

Application number :

67378  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Polymer for chemically amplified resist and a resist composition using the same  

Inventor :

Kim, Deog-Bae ; Chung, Yoon-Sik ; Choi, Yong-Joon ; Kim, Hyun-Jin  

Agent name :

 

Address for service :

 

Filing date :

25 August 2000  

Associated companies :

 

Applicant name :

Dongjin Semichem Co., Ltd.  

Applicant address :

 

Old name :

 

Original Source :

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