Plasma activated cvd method and device for producing a microcristalline si:h layer
A Standard patent application filed on 25 July 2000 credited to Danielzik, Burkhard ; Freitag, Nina ; Mohl, Wolfgang

Details

Application number :

66974  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Plasma activated cvd method and device for producing a microcristalline si:h layer  

Inventor :

Danielzik, Burkhard ; Freitag, Nina ; Mohl, Wolfgang  

Agent name :

 

Address for service :

 

Filing date :

25 July 2000  

Associated companies :

 

Applicant name :

Lohmeyer, Manfred  

Applicant address :

 

Old name :

 

Original Source :

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