Exposure method, exposure system, light source, and method of device manufacture
A Standard patent application filed on 21 July 2000 credited to Hamamura, Yutaka ; Nomura, Tatsushi ; Hiramatsu, Kazumasa ; Nishi, Kenji ; Takeuchi, Hitoshi

Details

Application number :

60224  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Exposure method, exposure system, light source, and method of device manufacture  

Inventor :

Hamamura, Yutaka ; Nomura, Tatsushi ; Hiramatsu, Kazumasa ; Nishi, Kenji ; Takeuchi, Hitoshi  

Agent name :

 

Address for service :

 

Filing date :

21 July 2000  

Associated companies :

 

Applicant name :

Nikon Corporation  

Applicant address :

 

Old name :

 

Original Source :

Go