Process and apparatus for implanting oxygen ions silicon wafers
A Standard patent application filed on 22 June 2000 credited to Dolan, Robert ; Ryding, Geoffrey ; Farley, Marvin ; Cordts, Bernhard

Details

Application number :

58834  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Process and apparatus for implanting oxygen ions silicon wafers  

Inventor :

Dolan, Robert ; Ryding, Geoffrey ; Farley, Marvin ; Cordts, Bernhard  

Agent name :

 

Address for service :

 

Filing date :

22 June 2000  

Associated companies :

 

Applicant name :

Ibis Technology, Inc.  

Applicant address :

 

Old name :

 

Original Source :

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