Spin, rinse, and dry station with adjustable nozzle assembly for semiconductor wafer backside rinsing
A Standard patent application filed on 28 June 2000 credited to Wong, Larry Ping-Kwan

Details

Application number :
57781  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Spin, rinse, and dry station with adjustable nozzle assembly for semiconductor wafer backside rinsing  
Inventor :
Wong, Larry Ping-Kwan  
Agent name :
 
Address for service :
 
Filing date :
28 June 2000  
Associated companies :
 
Applicant name :
Lam Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor