Resistively heated photothermographic media on vesicular substrate
A Standard patent application filed on 19 May 1987 credited to Ask, David Turner
;
Labelle, Gary Elzear
Details
Application number :
73182
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
Resistively heated photothermographic media on vesicular substrate
Inventor :
Ask, David Turner
;
Labelle, Gary Elzear
Agent name :
SPRUSON & FERGUSON
Address for service :
GPO Box 3898 SYDNEY NSW 2001
Filing date :
19 May 1987
Associated companies :
Applicant name :
Minnesota Mining and Manufacturing Company
Applicant address :
3M Center, St. Paul, Minnesota, United States of America