Method of depositing thin film of metal oxide by magnetron sputtering apparatus
A Standard patent application filed on 20 January 2000 credited to Nishio, Hitoshi
;
Suzuki, Takayuki
Details
Application number :
12504
Application type :
Standard
Application status :
SEALED
Under opposition :
No
Proceeding type :
Invention title :
Method of depositing thin film of metal oxide by magnetron sputtering apparatus
Inventor :
Nishio, Hitoshi
;
Suzuki, Takayuki
Agent name :
PHILLIPS ORMONDE FITZPATRICK
Address for service :
367 Collins Street MELBOURNE VIC 3000
Filing date :
20 January 2000
Associated companies :
Applicant name :
Kaneka Corporation
Applicant address :
2-4 Nakanoshima 3-chome Kita-ku Osaka-shi Osaka 530-0005 Japan