Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
A Standard patent application filed on 15 February 2000 credited to Dotter, Buddie R. II
;
Doehler, Joachim
;
Ovshinsky, Herbert C.
;
Izu, Masatsugu
;
Ellison, Timothy
Details
Application number :
55858
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
Inventor :
Dotter, Buddie R. II
;
Doehler, Joachim
;
Ovshinsky, Herbert C.
;
Izu, Masatsugu
;
Ellison, Timothy
Agent name :
Davies Collison Cave
Address for service :
Level 15 1 Nicholson Street MELBOURNE VIC 3000
Filing date :
15 February 2000
Associated companies :
Applicant name :
Energy Conversion Devices Inc.
Applicant address :
1675 W. Maple Road Troy MI 48084 United States Of America