Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of the same in forming films on substrates
A Standard patent application filed on 25 September 1985 credited to Winkle, Mark Robert ; Emmons, William David

Details

Application number :

47862  

Application type :

Standard  

Application status :

CEASED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of the same in forming films on substrates  

Inventor :

Winkle, Mark Robert ; Emmons, William David  

Agent name :

Davies Collison Cave  

Address for service :

Level 15 1 Nicholson Street MELBOURNE VIC 3000  

Filing date :

25 September 1985  

Associated companies :

 

Applicant name :

Rohm and Haas Company  

Applicant address :

Independence Mall West, Philadelphia, Pennsylvania 19105, U.S.A.  

Old name :

 

Original Source :

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