A method for error reduction in lithography
A Standard patent application filed on 22 May 2000 credited to Sandstrom, Torbjorn ; Ekberg, Peter ; Thuren, Anders ; Ekberg, Mats ; Askebjer, Per

Details

Application number :

52612  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

A method for error reduction in lithography  

Inventor :

Sandstrom, Torbjorn ; Ekberg, Peter ; Thuren, Anders ; Ekberg, Mats ; Askebjer, Per  

Agent name :

 

Address for service :

 

Filing date :

22 May 2000  

Associated companies :

 

Applicant name :

Micronic Laser Systems AB  

Applicant address :

 

Old name :

 

Original Source :

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