Nanoporous material fabricated using a dissolvable reagent
A Standard patent application filed on 05 May 2000 credited to Leung, Roger ; Fan, Wenya ; Sikonia, John ; Wu, Hui Jung

Details

Application number :

47000  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Nanoporous material fabricated using a dissolvable reagent  

Inventor :

Leung, Roger ; Fan, Wenya ; Sikonia, John ; Wu, Hui Jung  

Agent name :

 

Address for service :

 

Filing date :

05 May 2000  

Associated companies :

 

Applicant name :

Allied-Signal Inc.  

Applicant address :

 

Old name :

 

Original Source :

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